Equipment:
Nanobeam nB5 Electron beam lithography (EBL), dielectric deposition and etching (silicon nitride, amorphous silicon, gallium nitride), metal deposition (chrome, gold, nickel), femtosecond lasers, scanning electorn microscope, shack hartmann wavefront sensors, Spatial Light Modulator (SLM), metasurface characterisation setup in the visible, optical fibres, nmRC facility, ...
Scientific focus and expertise:
Plasmonics, metasurfaces, dielectric metasurfaces, metalenses, high-efficiency metamaterials, absorbers, fractals, holography, optical trapping, nanofabrication, large area nanofabrication, 3D imaging, metasurface design and simulation, light-field imaging...
Materials class:
dielectrics, metasurfaces, silicon nitride, amorphous silicon, poly silicon, silicon, transmissive metasurfaces, absorbing metasurfaces
Research challenge:
Using dielectric metasurfaces (which have high efficiency, and/or large areas) for real-world imaging applications, especially for life-sciences and optical fibre fabrication challenges. Particular focus on light-field iamging using lens arrays for comapct devices.
Application:
Lenses, broadband absorbers, high efficiency metasurfaces, biomedical imaging, optical tweezing, optical trapping, light field imaging, 3d imaging, modular devices, holography, asymmetric devices, optical fibre imaging, microrheology, ...
Market Sector:
healthcare (3D imaging, endoscopy, multimodal, microrheology), defence and security (space, cubesats, lightweight systems, ultrathin systems, anticounterfeiting, infrared), communication (optical fibres, mode sorting), microscopy, photography, ...