Equipment:
Atomic layer deposition. Currently I can deposit metal oxides and nitride films. Sub nanometre thin films are possible to grow with ALD, with great thickness control. ALD is also very good at conformally coating high aspect ratio structures.
Scientific focus and expertise:
Photovoltaics, energy storage (batteries) and THz modulation.
Materials class:
Dielectrics, conductive films, semiconductors
Organisation:
Academia
ECR (Early Career Researcher)
Special Interest Group(s):
Manufacturing and Scale Up
Forum(s):
Horizon Scanning and Disruptive Concepts
Industry / KTN
Outreach and Education
Challenge Areas:
Health
Space & Aviation
Sustainability